Dependence of plasma-induced modification of polymer surfaces on polyatomic ion chemistry

Fluorocarbon plasmas are widely used to chemically modify surfaces and deposit thin films. The deposition of mass selected fluorocarbon ions is useful for isolating the effects specific to polyatomic ions. In this study, the detailed chemical modifications that result from the deposition of beams of polyatomic fluorocarbon ions (C3F5 + and CF3 ) on polystyrene surfaces at experimental fluxes are identified using classical molecular dynamics simulations. These simulations elucidate how and why more efficient fluorination of the surface is achieved by CF3 + ion beam deposition, but C3F5 + ions are more efficient at growing fluorocarbon thin films. © 2004 American Institute of Physics. [DOI: 10.1063/1.1764597]